原著論文Paper
- S. Fuji, Y. Isoda, X. Lingling, M. Haruta, T. Majima, Y. Shimakawa, and D. Kan,
"Correlation between structural properties and electrochemical proton insertion in (001) VO2 epitaxial films"
Appl. Phys. Express, 18, 045501:1-5 (2025).
DOI: 10.35848/1882-0786/adc8f9 - Y. Shen, K. Ooe, K. Shitara, S. Kobayashi, T. Yoshimura, T. Yamada, L. Xie, Y. Shimakawa, and D. Kan,
"Ultrathin freestanding membranes of ZrO2 with metastable structures and strain-dependent electrical properties"
Phys. Rev. Mater., 9, 024411:1-9 (2025).
DOI: 10.1103/PhysRevMaterials.9.024411 - L. Xie, Y. Isoda, S. Nakamizo, Y. Shen, S. Fuji, T. Majima, Y. Shimakawa, and D. Kan,
"Effect of substrate-induced compressive strain on protonation of SrCoO2.5 epitaxial films"
Jpn. J. Appl. Phys., 64, 025501:1-5 (2025).
DOI: 10.35848/1347-4065/adaab7 - Y. Isoda; T. N. Pham, R. Aso, S. Nakamizo, T. Majima, S. Hosokawa, K. Nitta, Y. Morikawa, Y. Shimakawa, and D. Kan,
"Stabilization of oxygen vacancy ordering and electrochemical-proton-insertion-and-extraction-induced large resistance modulation in strontium iron cobalt oxides Sr(Fe,Co)Oy"
Nat. Commun., 16, 56:1-9 (2025).
DOI: 10.1038/s41467-024-55517-y - L. Xie, Y. Isoda, S. Nakamizo, T. Majima, S. Hosokawa, K. Nitta, Y. Shimakawa, and D. Kan,
"Impact of Interfacial Proton Accumulation on Protonation in a Brownmillerite Oxide"
Adv. Func. Mater., 34, 2410084:1-7 (2024).
DOI: 10.1002/adfm.202410084 - Y. Shen, K. Ooe, X. Yuan, T. Yamada, S. Kobayashi, M. Haruta, D. Kan, and Y. Shimakawa,
"Ferroelectric freestanding hafnia membranes with metastable rhombohedral structure down to 1-nm-thick"
Nat. Commun., 15, 4789:1-9 (2024).
DOI: 10.1038/s41467-024-49055-w - R. Watanabe, M. Goto, Y. Kosugi, D. Kan, and Y. Shimakawa,
"Oxygen Release and Incorporation Behaviors in BaFeO3 Polymorphs with Unusually High-Valence Fe4+"
Chem. Mater., 36, 5184-5191 (2024).
DOI: 10.1021/acs.chemmater.3c03236 - L. Xie, Y. Isoda, T. Majima, Y. Shen, D. Kan, and Y. Shimakawa,
"Orientation-dependent electrochemical response of LaSrNiO4 epitaxial films"
J. Solid State Electrochem., 28, 4519-4525 (2024).
DOI: 10.1007/s10008-023-05759-5